Postdoctoral Appointee - Atomic Layer Deposition for X-ray Optics Fabrication

The X-ray Science Division (XSD) at Argonne National Laboratory seeks a Postdoctoral Appointee to contribute to the development of advanced diffractive X-ray optics fabricated by atomic layer deposition (ALD). The successful candidate will develop and optimize ALD processes for the deposition of thick multilayer structures on both flat and patterned substrates, and will characterize film thickness, crystallinity, strain, and optical properties using a broad range of analytical techniques, including X-ray diffraction, X-ray reflectometry, transmission X-ray microscopy, and electron microscopy.

Additional responsibilities will include contributing to the specification, design, and commissioning of ALD reactor systems, as well as developing metrology methods to monitor and improve deposition accuracy during extended deposition campaigns. The appointee will also participate in the testing and evaluation of diffractive optics at the 1-BM beamline and possibly other beamlines of the Advanced Photon Source.

This position, within the XSD/Optics Group, offers a unique opportunity to work at the forefront of X-ray optics development in a highly collaborative environment, partnering with researchers across multiple Argonne divisions, including the Center for Nanoscale Materials (CNM), the Materials Science Division (MSD), and the Applied Materials Division.

• Ph.D. in Chemistry, Materials Science and Engineering, Chemical Engineering, Physics, or a closely related field completed within the last 0-5 years.
• Demonstrated hands-on experience with atomic layer deposition (ALD) reactor operation, precursor chemistry, or process development.
• Experience with thin-film materials characterization techniques, such as ellipsometry, reflectometry, or microscopy, as well as electron microscopy techniques (SEM and/or TEM) for structural analysis.
• Strong record of peer-reviewed publications commensurate with career stage.
• Good written and verbal communication skills.
• Ability to work both independently and collaboratively in a multidisciplinary research environment.

• Familiarity with reaction kinetics and chemistry for ALD processes.
• Background in thin-film metrology instrumentation.
• Experience with nanofabrication processes, including lithography, deep reactive-ion etching, or related microfabrication techniques.

Please note that the pay range information is a general guideline only. The pay offered to a selected candidate will be determined based on factors such as, but not limited to, the scope and responsibilities of the position, the qualifications of the selected candidate, business considerations, internal equity, and external market pay for comparable jobs. Additionally, comprehensive benefits are part of the total rewards package.

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