Senior Lithography and Photomask Process Engineer

• Photomask and Reticle Operations: Oversee photomask incoming quality control, pellicle integrity, reticle qualification protocols, and reticle lifecycle management across advanced EUV and DUV toolsets.

• Advanced Pellicle Development: Drive next gen EUV pellicle development, material optimization for enhanced transmission, stability, defect mitigation and overall yield improvement. Optimize reticle usage, inspection and disposition strategies over life cycle.

• Cross-Functional Process Integration: Partner closely with Scanner/Litho teams, Reticle Design, Thin Films, Etch, and Yield Enhancement engineering teams to diagnose patterning excursions and accelerate technology transitions.

• Yield Ramp and Excursion Containment: Lead root cause failure analysis (RCFA) for yield-limiting lithography and reticle-related defects during new process node development and high-volume manufacturing (HVM).

• Technical Mentorship and Industry Engagement: Provide technical leadership to junior and mid-level process engineers, establish standard operating procedures (SOPs), and collaborate directly with leading lithography and mask equipment suppliers.